環境資源報告成果查詢系統

產業廢水污染調查及管制措施研議計畫(第三年)

中文摘要 依據98年度擬定和推動之污染預防管理與監測機制,99年度推動光電材料及元件製造業「前端製程化學品管理」與「末端廢水水質監測機制」示範計畫執行成果,前者係要求事業定期申報指定製程化學品之使用量;後者則要求事業進行放流水銦、鎵、鉬、總毒性有機物和生物急毒性之檢測分析,100年度彙整示範計畫執行成效。此外,針對晶圓製造及半導體製造業放流水進行水質調查分析,並研訂該業別之管制項目與限值。 依調查數據綜合評估顯示水污染管制事業與污水下水道系統氨氮排放總量約為76,167 kg/day (總排放水量乘以平均濃度),最大貢獻來源為畜牧業,占所有氨氮污染總量的21.4%,其次為科學工業園區污水下水道系統、公共污水下水道系統和石油化學專業區專用下水道系統和石油化學業;部分相關產、公 (協) 會和目的事業主管機關已著手進行含氮水質調查評估。依據氨氮排放總量估算結果和水質調查家數比例,建議後續優先進行科學工業園區污染下水道系統放流水氨氮管制評估。 本計畫推動晶圓製造及半導體製造業、石油化學業和石油化學專業區污水下水道系統放流水標準修訂及相關行政管制事宜,並前往韓國考察放流水生物急毒性之管制方式,另針對含氯有機溶劑運作事業之化工業進行水質調查和管制評析,建議優先將有機化合物和氨氮納入檢討,此外,並加以評析特定業別或項目的管制方式或限值之合理性 (如電鍍業之COD標準)。
中文關鍵字 晶圓製造及半導體製造業;氨氮;放流水標準

基本資訊

專案計畫編號 EPA-100-G104-02-215 經費年度 100 計畫經費 6600 千元
專案開始日期 2011/02/24 專案結束日期 2011/12/31 專案主持人 朱敬平
主辦單位 水保處 承辦人 鄧志夫 執行單位 財團法人中興工程顧問社

成果下載

類型 檔名 檔案大小 說明
期末報告 EPA-100-G104-02-215.pdf 25MB

The Study of Pollutant Characteristics of Industrial Wastewater and Control Measures (Third Year)

英文摘要 According to the pollution prevention and monitoring mechanisms drafted in 2009, the Environmental Protection Agency (EPA) promotes the demonstration plan that includes detailed chemicals disclosure in the manufacturing process (upstream) and wastewater monitoring (downstream) in the optoelectronic industry and Science Park in 2010. The study has summarized the results of the demonstration plan in 2011. For the chemicals disclosure, the manufacturers are asked to regularly declare the raw materials used by the industries. For the wastewater monitoring, the manufacturers are asked to check for the indium, gallium, molybdenum, total toxic organic (TTO), and acute toxicity in the effluent. Further, the plan has investigated the effluent quality and draw up the regulated items and standards of wafer and semiconductor manufacture industry. There are many industries that discharge ammonia-nitrogen in their wastewater. The investigation estimated that total ammonia-nitrogen discharged from industries was 76,167 kg/day. The largest contributor was sewage system in animal husbandry, and its load was estimated to be 21.4% of the total ammonia-nitrogen. Further, both Science Park, public sewers, petrochemical industrial parks and petrochemical industry also have high pollution potential. Some industry associations and organizations have started the investigation and analysis of nitrogen-containing wastewater. The plan has suggested to evaluate the regulation of ammonia for Science Park in priority according to the total ammonia-nitrogen and the percentage of investigated factories. The plan has revised and set the Effluent Standard, Effluent Standards of Semiconductor Manufacture Industry, Effluent Standards of Petrochemical Industry, Effluent Standards of Petrochemical Industrial Parks Sewage System. Besides, we gathered information on the regulations of the effluent acute toxicity in Korea. Further, the plan has investigated the wastewater characteristics of chemical industry and evaluated the regulation. The plan has presented the suggestion of regulation of organic compounds and ammonia-nitrogen. Furthermore, the plan also investigates the appropriateness of regulations and standards for specific industry or items (such as the COD standard of electroplating manufacture industry).
英文關鍵字 Wafer and Semiconductor Manufacturing Industry;Ammonia Nitrogen;Effluent Standard