| 英文摘要 |
Extractive Fourier Transform Infrared (FTIR) Spectrometry is a directive sampling and analytical method in the field, without any sample pretreatment, suitable for the analysis of pollutants in atmosphere air and emission exhaust of the semiconductor manufacturing industry.
This study was aimed to establish the procedural and Quality Assurance and Quality Control (QA/QC) bases for gaseous concentration measurements of 13 pollutants, i.e., PH3, AsH3, CF4, SiH4, C2F6, CHF3, NF3, WF6, SF6, HCF2CF2CH2OH, (CH3)2SO, (C2H5O)4Si, and SiCl2H2, in emission exhaust and atmosphere air. Since SiCl2H2 is rapidly hydrolysed in the atmosphere air, the FTIR Gaseous Standard Quantitative Spectra and analytical methods of other 12 pollutants were developed in this study. This test methods have been tested and validated according to the “Principle of the Validation of Test Method”, including the validations of calibration curve, method detection limit, concentration range, precision, and accuracy. We have employed an appropriate mathematical analysis to determine the preliminary analyte concentrations of mixed spectra. For field validation test, we have made measurements on the gases of two emission exhausts and the perimeter of the semiconductor manufacturing facilities in the Scientific Park. A protocol of this test method was accordingly proposed.
Since the method detection limits of these 12 pollutants are lower than the TLVs of these 12 pollutants, this extractive FTIR protocol can fulfil the detection requirement of the “Standard for Air Pollution Control and Emissions of Semiconductor Industry” issued January 6, 1999. For the detection requirement of pollutants on the perimeter of the manufacturing facilities, except for PH3 and AsH3, the method detection limits of other 10 pollutants are within the limits required.
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